@article{10.1117/1.JMM.25.3.031606,
title = {Enhanced extreme ultraviolet mask imaging with Fourier ptychographic microscopy},
author = {Chaoying Gu and Markus P. Benk and Antoine Islegen-Wojdyla and Kenneth A. Goldberg and Laura Waller},
url = {https://doi.org/10.1117/1.JMM.25.3.031606},
doi = {10.1117/1.JMM.25.3.031606},
year = {2026},
date = {2026-01-01},
journal = {Journal of Micro/Nanopatterning, Materials, and Metrology},
volume = {25},
number = {3},
pages = {031606},
publisher = {SPIE},
keywords = {aberration reconstruction, aperture synthesis, computational imaging, extreme ultraviolet, Extreme ultraviolet lithography, Fourier ptychography, Fresnel zoneplates, full-field imaging, Image restoration, Image sharpness, Imaging systems, Light sources and illumination, Microscopes, Nanoimprint lithography, Photomasks, Pupil aberrations, Reconstruction algorithms},
pubstate = {published},
tppubtype = {article}
}