Publications
Multi-layer Born multiple-scattering model for 3D phase microscopy Journal Article
In: Optica, vol. 7, no. 5, pp. 394–403, 2020.
Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks Journal Article
In: Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 16, no. 4, pp. 1 – 15, 2017.
SEAGLE: Sparsity-driven image reconstruction under multiple scattering Journal Article
In: IEEE Transactions on Computational Imaging, vol. 4, no. 1, pp. 73–86, 2017.
Modeling light propagation in 3D phase objects Proceedings Article
In: 3D Image Acquisition and Display: Technology, Perception and Applications, pp. DW2F–2, Optical Society of America 2017.
Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask Proceedings Article
In: Panning, Eric M (Ed.): Extreme Ultraviolet (EUV) Lithography VIII, pp. 232 – 240, International Society for Optics and Photonics SPIE, 2017.
Effect of amplitude roughness on EUV mask specifications Proceedings Article
In: Photomask Technology 2014, pp. 92351A, International Society for Optics and Photonics 2014.
Predicting LER PSD caused by mask roughness using a mathematical model Proceedings Article
In: Extreme Ultraviolet (EUV) Lithography V, pp. 90482X, International Society for Optics and Photonics 2014.
Instability dynamics in photonic plasma Proceedings Article
In: 53rd Annual Meeting of the APS Division of Plasma Physics , American Physical Society, 2011.
Instability-driven recovery of diffused images Journal Article
In: Optics letters, vol. 36, no. 18, pp. 3711–3713, 2011.
Design and optimization of broadband wide-angle antireflection structures for binary diffractive optics Journal Article
In: Optics letters, vol. 35, no. 7, pp. 907–909, 2010.