Publications

Publications

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Michael Chen; David Ren; Hsiou-Yuan Liu; Shwetadwip Chowdhury; Laura Waller

Multi-layer Born multiple-scattering model for 3D phase microscopy Journal Article

In: Optica, vol. 7, no. 5, pp. 394–403, 2020.

Abstract | Links | BibTeX | Tags: 3D imaging, multiple-scattering, optical models, phase imaging

Stuart Sherwin; Andrew Neureuther; Patrick Naulleau

Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks Journal Article

In: Journal of Micro/Nanolithography, MEMS, and MOEMS, vol. 16, no. 4, pp. 1 – 15, 2017.

Links | BibTeX | Tags: EUV, experimental design, lithography, optical models

Hsiou-Yuan Liu; Dehong Liu; Hassan Mansour; Petros T Boufounos; Laura Waller; Ulugbek S Kamilov

SEAGLE: Sparsity-driven image reconstruction under multiple scattering Journal Article

In: IEEE Transactions on Computational Imaging, vol. 4, no. 1, pp. 73–86, 2017.

Links | BibTeX | Tags: algorithms, multiple-scattering, optical models

Regina Eckert; Nicole A Repina; Michael Chen; Yishuang Liang; Ren Ng; Laura Waller

Modeling light propagation in 3D phase objects Proceedings Article

In: 3D Image Acquisition and Display: Technology, Perception and Applications, pp. DW2F–2, Optical Society of America 2017.

Links | BibTeX | Tags: multiple-scattering, optical models

Stuart Sherwin; Thomas V Pistor; Andrew Neureuther; Patrick Naulleau

Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask Proceedings Article

In: Panning, Eric M (Ed.): Extreme Ultraviolet (EUV) Lithography VIII, pp. 232 – 240, International Society for Optics and Photonics SPIE, 2017.

Links | BibTeX | Tags: EUV, lithography, optical models

Rene A Claus; Andrew R Neureuther; Patrick P Naulleau; Laura Waller

Effect of amplitude roughness on EUV mask specifications Proceedings Article

In: Photomask Technology 2014, pp. 92351A, International Society for Optics and Photonics 2014.

Links | BibTeX | Tags: EUV, optical models

Rene A Claus; Andrew R Neureuther; Laura Waller; Patrick P Naulleau

Predicting LER PSD caused by mask roughness using a mathematical model Proceedings Article

In: Extreme Ultraviolet (EUV) Lithography V, pp. 90482X, International Society for Optics and Photonics 2014.

Links | BibTeX | Tags: EUV, optical models

Seth Davidovits; Laura Waller; Stefan Muenzel; Can Sun; Dmitry V Dylov; Jason W Fleischer

Instability dynamics in photonic plasma Proceedings Article

In: 53rd Annual Meeting of the APS Division of Plasma Physics , American Physical Society, 2011.

Links | BibTeX | Tags: optical models

Dmitry V Dylov; Laura Waller; Jason W Fleischer

Instability-driven recovery of diffused images Journal Article

In: Optics letters, vol. 36, no. 18, pp. 3711–3713, 2011.

Links | BibTeX | Tags: optical models

Chih-Hao Chang; Laura Waller; George Barbastathis

Design and optimization of broadband wide-angle antireflection structures for binary diffractive optics Journal Article

In: Optics letters, vol. 35, no. 7, pp. 907–909, 2010.

Links | BibTeX | Tags: experimental design, optical models