Publications

@inproceedings{10.1117/12.2552967,

title = {Quantitative phase retrieval for EUV photomasks},

author = {Stuart Sherwin and Isvar Cordova and Ryan Miyakawa and Laura Waller and Andrew Neureuther and Patrick Naulleau},

editor = {Nelson M Felix and Anna Lio},

url = {https://doi.org/10.1117/12.2552967},

doi = {10.1117/12.2552967},

year  = {2020},

date = {2020-03-23},

booktitle = {Extreme Ultraviolet (EUV) Lithography XI},

volume = {11323},

pages = {234 -- 243},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {algorithms, EUV, phase imaging},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{sherwin2019measuring,

title = {Measuring the Phase of EUV Photomasks},

author = { Stuart Sherwin and Isvar Cordova and Laura Waller and Andrew R Neureuther and Patrick P Naulleau},

url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11147/111471F/Measuring-the-Phase-of-EUV-Photomasks/10.1117/12.2538107.full},

year  = {2019},

date = {2019-11-11},

booktitle = {International Conference on Extreme Ultraviolet Lithography 2019},

volume = {11147},

pages = {111471F},

organization = {International Society for Optics and Photonics},

keywords = {absorber, EUV, multilayer, phase-imaging},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{sherwin2019advanced,

title = {Advanced multilayer mirror design to mitigate EUV shadowing},

author = { Stuart Sherwin and Laura Waller and Andrew R Neureuther and Patrick P Naulleau},

url = {https://www.spiedigitallibrary.org/conference-proceedings-of-spie/10957/1095715/Advanced-multilayer-mirror-design-to-mitigate-EUV-shadowing/10.1117/12.2515095.full},

year  = {2019},

date = {2019-03-26},

booktitle = {Extreme Ultraviolet (EUV) Lithography X},

volume = {10957},

pages = {1095715},

organization = {International Society for Optics and Photonics},

keywords = {aperiodic Mmultilayer mirror, EUV, EUV mask imaging, experimental design, multilayer, pyTorch},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{10.1117/12.2501970,

title = {EUV mask characterization with actinic scatterometry},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

editor = {Kurt G Ronse and Eric Hendrickx and Patrick P Naulleau and Paolo A Gargini and Toshiro Itani},

url = {https://doi.org/10.1117/12.2501970},

doi = {10.1117/12.2501970},

year  = {2018},

date = {2018-10-03},

booktitle = {International Conference on Extreme Ultraviolet Lithography 2018},

volume = {10809},

pages = {122 -- 135},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, learning-based, lithography, Reflectometry, Scatterometry},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{gunjala2018field,

title = {Field-varying aberration recovery in EUV microscopy using mask roughness},

author = { Gautam Gunjala and Antoine Wojdyla and Aamod Shanker and Stuart Sherwin and Markus P Benk and Kenneth A Goldberg and Patrick P Naulleau and Laura Waller},

url = {https://www.osapublishing.org/abstract.cfm?uri=COSI-2018-CW2E.2},

year  = {2018},

date = {2018-06-25},

booktitle = {Computational Optical Sensing and Imaging},

pages = {CW2E--2},

organization = {Optical Society of America},

keywords = {aberrations, EUV, speckle, statistical optics},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{shanker2018speckle,

title = {Speckle metrology for extreme ultra-violet lithography},

author = { Aamod Shanker and Laura Waller and Gautam Gunjala and Antoine Wojdyla and Dmitriy Voronov and Patrick P Naulleau},

url = {https://doi.org/10.1117/12.2299605},

doi = {10.1117/12.2299605},

year  = {2018},

date = {2018-06-01},

booktitle = {Extreme Ultraviolet (EUV) Lithography IX},

volume = {10583},

pages = {105830T},

organization = {International Society for Optics and Photonics},

keywords = {aberrations, EUV, speckle, statistical optics},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{10.1117/12.2299271,

title = {Actinic EUV scatterometry for parametric mask quantification},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

editor = {Kenneth A Goldberg},

url = {https://doi.org/10.1117/12.2299271},

doi = {10.1117/12.2299271},

year  = {2018},

date = {2018-03-19},

booktitle = {Extreme Ultraviolet (EUV) Lithography IX},

volume = {10583},

pages = {323 -- 334},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, lithography, multiple-scattering, phase imaging, Reflectometry, Scatterometry},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{10.1117/12.2260412,

title = {Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask},

author = {Stuart Sherwin and Thomas V Pistor and Andrew Neureuther and Patrick Naulleau},

editor = {Eric M Panning},

url = {https://doi.org/10.1117/12.2260412},

doi = {10.1117/12.2260412},

year  = {2017},

date = {2017-03-24},

booktitle = {Extreme Ultraviolet (EUV) Lithography VIII},

volume = {10143},

pages = {232 -- 240},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, lithography, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{shanker2016off,

title = {Off-axis aberration estimation in an EUV microscope using natural speckle},

author = { Aamod Shanker and Antoine Wojdyla and Gautam Gunjala and Jonathan Dong and Markus P Benk and Andrew R Neureuther and Kenneth A Goldberg and Laura Waller},

url = {https://www.osapublishing.org/abstract.cfm?uri=ISA-2016-ITh1F.2},

year  = {2016},

date = {2016-07-25},

booktitle = {Imaging Systems and Applications},

pages = {ITh1F--2},

organization = {Optical Society of America},

keywords = {aberrations, EUV, speckle},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014effect,

title = {Effect of amplitude roughness on EUV mask specifications},

author = { Rene A Claus and Andrew R Neureuther and Patrick P Naulleau and Laura Waller},

url = {https://doi.org/10.1117/12.2069073},

doi = {10.1117/12.2069073},

year  = {2014},

date = {2014-10-08},

booktitle = {Photomask Technology 2014},

volume = {9235},

pages = {92351A},

organization = {International Society for Optics and Photonics},

keywords = {EUV, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014predicting,

title = {Predicting LER PSD caused by mask roughness using a mathematical model},

author = { Rene A Claus and Andrew R Neureuther and Laura Waller and Patrick P Naulleau},

url = {https://doi.org/10.1117/12.2046637},

doi = {10.1117/12.2046637},

year  = {2014},

date = {2014-04-17},

booktitle = {Extreme Ultraviolet (EUV) Lithography V},

volume = {9048},

pages = {90482X},

organization = {International Society for Optics and Photonics},

keywords = {EUV, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{shanker2013analysis,

title = {Analysis of edge effects in attenuating phase-shift masks using quantitative phase imaging},

author = { Aamod Shanker and Martin Sczyrba and Brid Connolly and Andrew R Neureuther and Laura Waller},

url = {https://doi.org/10.1117/12.2027825},

doi = {10.1117/12.2027825},

year  = {2013},

date = {2013-09-10},

booktitle = {Photomask Technology 2013},

volume = {8880},

pages = {88802A},

organization = {International Society for Optics and Photonics},

keywords = {EUV, phase imaging, TIE},

pubstate = {published},

tppubtype = {inproceedings}

}