Publications

@inproceedings{10.1117/12.2501970,

title = {EUV mask characterization with actinic scatterometry},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

editor = {Kurt G Ronse and Eric Hendrickx and Patrick P Naulleau and Paolo A Gargini and Toshiro Itani},

url = {https://doi.org/10.1117/12.2501970},

doi = {10.1117/12.2501970},

year  = {2018},

date = {2018-10-03},

booktitle = {International Conference on Extreme Ultraviolet Lithography 2018},

volume = {10809},

pages = {122 -- 135},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, learning-based, lithography, Reflectometry, Scatterometry},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{10.1117/12.2299271,

title = {Actinic EUV scatterometry for parametric mask quantification},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

editor = {Kenneth A Goldberg},

url = {https://doi.org/10.1117/12.2299271},

doi = {10.1117/12.2299271},

year  = {2018},

date = {2018-03-19},

booktitle = {Extreme Ultraviolet (EUV) Lithography IX},

volume = {10583},

pages = {323 -- 334},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, lithography, multiple-scattering, phase imaging, Reflectometry, Scatterometry},

pubstate = {published},

tppubtype = {inproceedings}

}