Journal papers

@article{10.1117/1.JMM.16.4.041012,

title = {Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

url = {https://doi.org/10.1117/1.JMM.16.4.041012},

doi = {10.1117/1.JMM.16.4.041012},

year  = {2017},

date = {2017-12-09},

journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},

volume = {16},

number = {4},

pages = {1 -- 15},

publisher = {SPIE},

keywords = {EUV, experimental design, lithography, optical models},

pubstate = {published},

tppubtype = {article}

}