Conference papers
Quantitative phase retrieval for EUV photomasks Inproceedings
In: Felix, Nelson M; Lio, Anna (Ed.): Extreme Ultraviolet (EUV) Lithography XI, pp. 234 – 243, International Society for Optics and Photonics SPIE, 2020.
Measuring the Phase of EUV Photomasks Inproceedings
In: International Conference on Extreme Ultraviolet Lithography 2019, pp. 111471F, International Society for Optics and Photonics 2019.
Advanced multilayer mirror design to mitigate EUV shadowing Inproceedings
In: Extreme Ultraviolet (EUV) Lithography X, pp. 1095715, International Society for Optics and Photonics 2019.
EUV mask characterization with actinic scatterometry Inproceedings
In: Ronse, Kurt G; Hendrickx, Eric; Naulleau, Patrick P; Gargini, Paolo A; Itani, Toshiro (Ed.): International Conference on Extreme Ultraviolet Lithography 2018, pp. 122 – 135, International Society for Optics and Photonics SPIE, 2018.
Field-varying aberration recovery in EUV microscopy using mask roughness Inproceedings
In: Computational Optical Sensing and Imaging, pp. CW2E–2, Optical Society of America 2018.
Speckle metrology for extreme ultra-violet lithography Inproceedings
In: Extreme Ultraviolet (EUV) Lithography IX, pp. 105830T, International Society for Optics and Photonics 2018.
Actinic EUV scatterometry for parametric mask quantification Inproceedings
In: Goldberg, Kenneth A (Ed.): Extreme Ultraviolet (EUV) Lithography IX, pp. 323 – 334, International Society for Optics and Photonics SPIE, 2018.
Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask Inproceedings
In: Panning, Eric M (Ed.): Extreme Ultraviolet (EUV) Lithography VIII, pp. 232 – 240, International Society for Optics and Photonics SPIE, 2017.
Off-axis aberration estimation in an EUV microscope using natural speckle Inproceedings
In: Imaging Systems and Applications, pp. ITh1F–2, Optical Society of America 2016.
Effect of amplitude roughness on EUV mask specifications Inproceedings
In: Photomask Technology 2014, pp. 92351A, International Society for Optics and Photonics 2014.
Predicting LER PSD caused by mask roughness using a mathematical model Inproceedings
In: Extreme Ultraviolet (EUV) Lithography V, pp. 90482X, International Society for Optics and Photonics 2014.
Analysis of edge effects in attenuating phase-shift masks using quantitative phase imaging Inproceedings
In: Photomask Technology 2013, pp. 88802A, International Society for Optics and Photonics 2013.